- Acids & Oxidizers
Acetic Acid
Al Etchant Type D
Buffered Oxide Etch 7:1 (Buffered HF)
Buffered Oxide Etch 10:1 (Buffered HF)
Buffered Oxide Etch with Surficant (Buffered HF)
Chromium Etchant
Citric Acid
Gold Etch TFA
Hydrochloric Acid
Hydrofluoric Acid
Hydrogen Peroxide
Lactic Acid
Lancer Acid LCA-A
Nitric Acid, Fuming
Nitric Acid
Phosphoric Acid
Sulfuric Acid
Tantalum Etchant- Base
- Developers and Removers
351 UN 1824 Sodium Hydroxide Solution
A Thinner
All Resist AR 600-51
All Resist AR-P 6200.02
All Resist ARP 6200.09
AZ 300 MIF Developer
AZ 400K
D 135-500 ZEP Remover
Dimethylacetamide ZEP520A remover
Emplura
MF CD 26 Developer
MBIK/IPA 1:3
MIBK PMMA Developer
n-Amyl Acetate ZEP520A Developer
Photoresist Stripper AZ 400T
PMGI SF
Remover PG
Shipley Microposit Remover 1165
SU-8 Developer- Equipment Components
Gallium-69 (Scios Dual Beam)
Hexagonal Boron Nitride Crystal
Inficon Crystals
Lithium Tantalate Crystal
Naphthalene (Scios Dual Beam)
Shell AW Hydraulic Oil 32 (Hydraulic Press)
Silicon Carbide Crystal Substrate
UN Certified Buckets
Yttria Stabilized Zirconia- Photoresists
950 PMMA A Series
495 PMMA A4
AZ 1518 Photoresist
AZ 3318D Photoresist
AZ P4210 Photoresist
AZ P4110 Photoresist
AZ P4620 Photoresist
AZ P5214 EIR Photoresist
Copolymer MMA(8.5) Series
Hexamethyldisilazane
LOR 5B
LOR 30B
ma-D 525
ma-N 2403 Negative Tone Photoresist
MCC Primer
MHA
OmniCoat
PRS-3000
S1805
S1818
SC TM 1827
SU-8 (100, 2001, 2002, 2005, 2015, 2100, 3050)
SU-8 2000 Series Resists
SU-8-TF-6000
ZEP520A- Polymers
PA 4100 HD
PA 410D HD
PA 400R
Sylgard 184 elastomer curing agent (PDMS)
Sylgard 184 Base (PDMS)
Parylene Dimer DPX-C- Solvents
Acetone
Anisole
Butanone
DI Water
Ethylene Glycol
Ethyl Alcohol
IPA
Methanol
N-Dimethylacetamide
Toluene
Xylene- Inorganics
Ammonium Sulfide NH42S
Ammonia Solution 28-30%
Liquid Metal Ion Source Gallium
Marble Chips
MIF 319 Developer
Remover ma-R404 S- Other Chemicals
Amyl Acetate
AquaSAVE
Calcium gluconate
DPX-C
E206 Silicone Mold Release
Fomblin Y LVAC (system lubricant)
Hexamethyldisilazane
MCC Primer
Pure Clear C-1000 Coolant
Santovac 5
Surpass 3000 Promotor
TriChloroSilane- Cleaners
LancerAcid
LancerClean Potassium Hydroxide
MegaClean Cleaning Products
NovaClean AFX
NovaClean Detergent
NovaHol
Micro 90 Solution- Gasses
5% Silane in Nitrogen
Ammonia
Argon
Boron Trichloride
Carbon Dioxide
Carbon Monoxide
Chlorine
CF4
C4F8
Distilled H2O
Halocarbon 14
Halocarbon 23
Halocarbon C318
Helium
Hydrogen
Hydrogen Bromide
Methane
Nitric Oxide
Nitrogen
Nitrous Oxide
Oxygen
P10 Methane in 90% Argon
Refridgerant R14
SulfurHexaflouride- NanoScribe Materials
IP-Dip Photolack
IP-G 780 Photolack
IP-L 780 Photolack
IP-S Photoresist- STREM ALD Gasses
BTBAS
Bisnickel
Bisdiethylaminosilane
di(t-butylamino)silane
Hafnium
Trimethylaluminum
TDMAT
TDMAZ- Metals
Ag-Silver
Al-Aluminium
Au-Gold
B-Boron
Co-Cobalt
Cr-Chromium
Cu-Copper
Fe-Iron
Ge-Germanium
Hf-Hafnium
Invar-Zinc Iron
MgO-Magnesium Oxide
MoO3-Molybdenum Oxide
Ni-Nickel
Pd-Palladium
Pt-Platinum
Ti-Titanium
V-Vanadium
W-Tungsten
Zn-Zinc
Zr-Zirconium Pieces
Additional listings:
Historic listing MSDS
University of Pittsburgh NanoScale Fabrication and Characterization Facility Violations Policy