AJA Three-Chamber Deposition System

High-vacuum three chamber system for high-quality superconducting thin film growth.

It integrates:

  • Electron-beam evaporation (Sn, Al, Ti, Ta, Pd, V)
  • Sputtering deposition (NbTiN, Ta, Al2O3, Nb, Pt)
  • In situ surface preparation (H2 cleaning, plasma cleaning, and annealing)
  • In situ surface analysis (RHEED, Auger spectroscopy)

Fully interconnected chambers and in situ sample transfer ensure ultra-clean interfaces and controlled growth of multilayer superconducting thin films.

Specification Sheet (PDF)

 

machine in lab
Left Chamber

 

 

machine in lab
Center Chamber

 

machine in lab
Right Chamber