10.1002/aelm.202500260

Journal Name
Advanced Electronic Materials
Publication Year
2025
Authors
Shaghayegh Mesforush, Alba Cazorla, Hayley Melville, Philippe Blanchard, Hagen Klauk, Ute Zschieschang, Min Zhang, Lamiaa Fijahi, Marta Mas‐Torrent, Esther Barrena
Publications Date
DOI
10.1002/aelm.202500260
Publication Source
OpenAlex
DOI URL
https://doi.org/10.1002/aelm.202500260
Locations
Upper Campus
Matched RRIDs
RRID:SCR_025139
Is Open Access
True
Cited By Count
2
Facilities
Advanced Imaging Core
Long Title
Gate‐Dielectric Surface Engineering With Fluorinated Monolayers: Minimizing Contact Resistance and Nonidealities in OFETs
OpenAlex ID
https://openalex.org/W4413989957
RRID Searched Term
RRID:SCR_025139