Hood 1 contains all photoresists, spinners, and hot plates used for photolithography processes. Hood 2 contains all electron beam resists, spinner, and hot plates used for electron beam lithography and is also suited for basic pattern development. Hood 3 offers a wide range of developers and removers, an ultrasonic bath, and hot plates to assist in all non-acidic development and wafer cleaning processes. Hood 4 offers the safety equipment and chemicals necessary for acidic wafer development. Hoods 1, 2, 3, all offer acetone, IPA, methanol, and DI water.
Acid/Caustic Hood, processes available:
- Acetic Acid
- Citric Acid
- Hydrochloric Acid (38%)
- Hydrogen Peroxide (30%)
- Hydrofluoric Acid (48%)
- Lactic Acid
- Sulfuric Acid
- Phosphoric Acid
- Nitric acid
- Buffered Oxide Etch, 7:1 with Surfactant
- Buffered Oxide Etch, 10:1 with Surfactant
- Al etchant- Transene type D
- Cr etchant-Transene 1020
- Gold Etchant – Type TFA
- Tantalum Etchant
Developer hood , chemistry available:
- SU-8 Developer (for SU8 and Nanoscribe IP resist)
- 1165 Remover
- Remover PG
- Surpass 3000 (promotor)
- MIBK/IPA 1:3
- AZ 400T Stripper
- ZEP 520A Developer (n-Amyl acetate, 99%)
- ZEP520A Remover
Inorganic cabinet:
- Remover R404 S
- Developer ma-D 525
- 351 (UN 1824 Sodium Hydroxide Solution)
- AZ 300 MIF Developer
- AZ 400K 1:4
- 351 MF-CD-26 Developer
- Ammonium Sulfide (NH4)2S
Spinner hood 1:
- AZ 400K 1:4
- 351 MF-CD-26 Developer
- Ammonium Sulfide (NH4)2S
- AZ 400K 1:4
- 351 MF-CD-26 Developer
- Ammonium Sulfide (NH4)2S
- AZ 400K 1:4
- AZ P4210
- AZ P4110
- AZ P4620
- LOR 5B
- AZ 5214-E IR
- AquaSAVE 532A
Spinner hood 2:
- PMMA 950K A1
- PMMA 950K A2
- PMMA 950K A3
- PMMA 950K A4
- PMMA 495K A4
- ZEP 520A
- ZEP 520A 1.7:1 Diluted
- MCC 80/20 Primer
- HMDS Primer
- MHA
- PMMA thinner
- mma(8.5) MAA EL9
- mma(8.5) MAA EL13
- ma-N 2403
- ZEP 520A 2.5:1
- ZEP 520A 3.5:1 (weight)
- Anisole, 99%, Extra Dry AcroSeal
- Acrylic Polymer
- PEG-A
Hood Oven:
Compact drying oven for baking semiconductor samples and heat treatment of bottles. It is an accessory of the hood1.
Key Features
- Temperature range: 10~250 C
- Temperature precision: ± 1 C
- Temperature uniformity: ± 3 C
- Dimensions: 40x46x40 cm
Key Applications and available processes
- Samples baking
- Heat treatment of bottles(with some particular photoresist like viscous SU8)
Check Availability
Already have an account?
Reserve this tool with the FOM.
Equipment Fee
Fabrication Service 1