The Nanoscribe Photonic Professional is an easy-to-operate table-top laser lithography system that enables the fabrication of true three-dimensional nanostructures using commercially available photoresists. Designed for the fabrication of photonic crystal structures, the instrument is also ideal for, e.g., generating three-dimensional scaffolds for biology, micro- and nanofluidic circuitry.
Key Features
- Laser power: 50-150 mW, Wavelength: 780 nm, Pulse ~100 fs, Repetition rate: 80 MHz
- Available for Conventional 3D printing mode, Dip-in Liquid mode and air mode
- From microscale(submicron) to macroscale(centimeter) 3D printing
- 3D printing with lateral resolution ~ 200 nm, vertical resolution ~ 300 nm
- High-precision Piezo scanning range: 300 x 300 x 300 μm3
- Motorized XY-scanning range: 100 x 100 mm2
Available photoresists
IP-dip, IP-S, IP-L, SU-8 (2001, 2001, 2015, 3050…), AZ4110, AZ4210, AZ4610, AZ5214 IR, S1805, and SC1827.
Key Applications and available processes
- Mechanical Metamaterials
- Microfluidics
- Photonics
- Plasmonics
- Biomimetrics
- Life sciences
- Micro-robotics
- Optical devices
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Equipment Fee
Fabrication Service 2
NanoScribe Capabilities
Core Facility
Gertrude E. and John M. Petersen Institute of NanoScience and Engineering
Location
Lower Campus
Equipment Type
Lithography