The Maskless Aligner MLA 150 is a state-of-the-art Maskless Lithography tool. Areas of application include nanofabrication of quantum devices (2D materials, semiconductor materials, nanowires, etc.) MEMS, micro-optical elements, sensors, actuators, MOEMS and other devices for materials and life sciences. Depending on the application, the MLA 150 patterns high-resolution, high aspect ratio, and even simple grayscale structures.
Key Features
- Laser wavelength: 375 nm
- Laser power: 2.8 W
- Minimum feature size: 0.6 um line
- Max. area: 150 x 150 mm²
- Overlay accuracy: 0.25 um
- Max. write speed: 285 mm2/min
- Optical focus
- High-aspect Ratio mode
Key Applications and available processes
Fast patterning of masks and wafers in Life Science, MEMS, Micro-Optics, Semiconductor, Sensors, Actuators, Materials Research.
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Equipment Fee
Fabrication Service 3
Core Facility
Gertrude E. and John M. Petersen Institute of NanoScience and Engineering
Location
Lower Campus
Equipment Type
Lithography